BUSINESS
EFEM Contamination Control Module

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FES
(Fume Eliminate System)
Safely eliminate harmful gases remaining on wafers after processing—right inside the equipment.
The Fume Eliminate System is a high-precision after-process purge solution that injects N₂ gas directly into the cassette containing processed wafers. This effectively removes residual gases from wafer surfaces, reduces internal humidity to below 6%, and fundamentally prevents secondary chemical reactions and contamination

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ECO EFEM
– Dehumidifying Contamination-Control EFEM
Humidity inside the EFEM can now become a source of contamination.
The ECO EFEM supplies dry, dehumidified air into the EFEM to maintain humidity below 10%, effectively preventing moisture-based contamination that may trigger sensitive reactions during processing. With a modular and customized design, it can be tailored to the structure and process requirements of each customer’s EFEM
